By Bei Yu,David Z. Pan

This ebook introduces readers to the main complex learn effects on layout for Manufacturability (DFM) with a number of patterning lithography (MPL) and electron beam lithography (EBL). The authors describe intimately a collection of algorithms/methodologies to unravel matters in glossy layout for manufacturability issues of complicated lithography. Unlike books that debate DFM from the product point or actual production point, this ebook describes DFM ideas from a circuit layout point, such that the majority of the severe difficulties should be formulated and solved via combinatorial algorithms.

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Design for Manufacturability with Advanced Lithography by Bei Yu,David Z. Pan


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